Reactive ion etching in the fabrication of niobium tunnel junctions
- 1 January 1981
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 17 (1) , 303-306
- https://doi.org/10.1109/tmag.1981.1061009
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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