Ion-beam sputtering deposition of fluoropolymer thin films
- 5 July 1993
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 63 (1) , 10-11
- https://doi.org/10.1063/1.109729
Abstract
It is shown that it is possible to deposit thin films with various CFx composition (1.26≤x≤1.83) by ion‐beam sputtering. These materials with ‘‘teflon‐like’’ composition have been deposited at room temperature by Ar ion‐beam sputtering of a teflon target; the film chemical composition has been determined by electron spectroscopy for chemical analysis. The fluorine‐to‐carbon ratio of the films, as well as their crosslinking degree, is shown to depend on the energy of the ions impinging on the target.Keywords
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