Oxidation of Si3N4 in the Range 1300° to 1500°C
- 1 September 1976
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 59 (9-10) , 399-403
- https://doi.org/10.1111/j.1151-2916.1976.tb09505.x
Abstract
The isothermal oxidation behavior of commercial hot‐pressed Si3N4 was evaluated for temperatures from 1300° to 1500°C. Multiphase scales were formed, consisting mainly of α‐cristobalite and enstatite. A large increase in reaction rate above 1450°C is believed to be caused by melting in the scale and the consequent increase in the rate of oxygen transport. No oxygen pressure dependence was observed at 1400°C over the oxygen pressure range 10‐9 atm to 600 torr. However, a small decrease in the kinetics was observed when measurements were made in reduced total pressures of oxygen as compared to O2/N2mixtures at a constant total pressure.Keywords
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