Surface damage and topography of erbium metal films implanted with helium to high fluences

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Abstract
Topographical and expansion effects which occur as a result of implanting erbium thin films with helium up to fluences of 1.5 × 1018 He+/cm2 are described. There exists an inverse relationship between critical dose and annealing temperature with respect to the formation of surface bubbles. Post implantation annealing at or below 400°C is found to strongly reduce implantation induced expansion for doses less than 3.5 × 1017 He+/cm2, but is observed to result in increased expansion above this dose. At temperatures above 400°C, expansion is increased for all doses investigated. Details of bubble development in the implanted layer are discussed and the manner in which surface bubbles develop from enlarged subsurface bubbles is illustrated.