Effects of oxidation conditions on the properties of tantalum oxide films on silicon substrates
- 1 January 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 207 (1-2) , 258-264
- https://doi.org/10.1016/0040-6090(92)90134-w
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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