Dispersion characteristics of thin films capacitances caused by surface trapping
- 1 March 1971
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 7 (3-4) , R17-R20
- https://doi.org/10.1016/0040-6090(71)90078-2
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Dielectric properties of thin films of aluminium oxide and silicon oxideThin Solid Films, 1968
- Instability in vacuum deposited silicon oxideIEEE Transactions on Electron Devices, 1967
- An investigation of instability and charge motion in metal-silicon oxide-silicon structuresIEEE Transactions on Electron Devices, 1966
- Dispersion and Absorption in Dielectrics I. Alternating Current CharacteristicsThe Journal of Chemical Physics, 1941