Reduction of surface roughness by Ta2O5 film formation with O2 cluster ion assisted deposition
- 1 May 2003
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 206, 870-874
- https://doi.org/10.1016/s0168-583x(03)00881-4
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Nano-processing with gas cluster ion beamsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2000
- Gas cluster ion beam equipments for industrial applicationsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1995
- Low-damage surface processing by gas cluster ion beamsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1995
- Surface modification with gas cluster ion beamsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993
- Irradiation Effects of Ar-Cluster Ion Beams on Si SurfacesMRS Proceedings, 1993
- Energy dependence of the ion-induced sputtering yields of monatomic solidsAtomic Data and Nuclear Data Tables, 1984