The oxidation of thin chromium films
- 22 August 2002
- journal article
- Published by Elsevier
- Vol. 34 (1) , 111-114
- https://doi.org/10.1016/0040-6090(76)90145-0
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Effect of pressure changes on the oxidation rate of aluminium in the temperature range 323–673 KJournal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, 1972
- The effect of an electric field on the oxidation rate of nickel between 250 and 380°CSurface Science, 1970
- Preparation and Properties of Chromium FilmsJournal of Applied Physics, 1968