Characteristics of TiB2 films prepared by ion beam sputtering
- 31 January 1996
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 78 (1-3) , 37-41
- https://doi.org/10.1016/0257-8972(94)02388-3
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Deposition of TiB2 at low temperature with low residual stress by a vacuum arc plasma sourceSurface and Coatings Technology, 1993
- Tribological properties of r.f. sputtered Ti-B-N coatings under various pin-on-disc wear test conditionsSurface and Coatings Technology, 1993
- Crystalline TiB2 coatings prepared by ion-beam-assisted depositionThin Solid Films, 1991
- Analysis of r.f.-sputtered TiB2 hard coatings by means of X-ray diffractometry and Auger electron spectroscopyMaterials Science and Engineering: A, 1991
- Deposition of TiB2 films by a co-sputtering methodThin Solid Films, 1988
- The preparation and characterization of titanium boride filmsThin Solid Films, 1987
- Material selection for hard coatingsJournal of Vacuum Science & Technology A, 1986
- TiB2 and ZrB2 diffusion barriers in GaAs Ohmic contact technologyJournal of Vacuum Science & Technology A, 1985
- Thick boride coatings by chemical vapor depositionThin Solid Films, 1982
- Structure and properties of refractory compounds deposited by direct evaporationThin Solid Films, 1977