Etching Rate of an Ion-Bombarded Tungsten (110) Surface
- 15 March 1967
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 38 (4) , 1989-1991
- https://doi.org/10.1063/1.1709806
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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- Chemical Etching of Charged-Particle Tracks in SolidsJournal of Applied Physics, 1962
- Etching of Abraded Germanium Surfaces with CP-4 ReagentJournal of the Electrochemical Society, 1962
- Characteristics of the {111}Surfaces of the III–V Intermetallic CompoundsJournal of the Electrochemical Society, 1961
- Electron Microscope Studies on the Etching of Irradiated GermaniumJournal of Applied Physics, 1959