Anomalous effects on the current-voltage characteristics of p-channel metal-oxide-semiconductor transistors in the temperature range 4.2–50 K
- 15 August 1990
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 68 (4) , 1896-1901
- https://doi.org/10.1063/1.346579
Abstract
The current-voltage characteristics of p-channel MOSFETs (metal-oxide-semiconductor field-effect transistors) in the temperature range 4.2-50 K have been investigated in detail. A peak is observed at the beginning of the drain-current–drain-voltage (Id, Vd) curves for low Vg values, which is not observed in the case of n-channel MOSFETs and is found to be a very slow transient effect. This time-dependent peak is observed for temperatures below ∼25 K and for channel lengths greater than ∼3 μm. In this temperature range a strong hysteresis effect is also observed at low Vg voltages. The above behavior will be explained in terms of a very slow depletion layer formation in the drain region, introduced by the large time constant of the field-assisted thermal emission of carriers in n-type bulk semiconductors at temperatures below ∼20 K. Another effect, analogous to the ‘‘kink effect’’ observed in n-channel MOSFETs at temperatures below 16 K, is also observed for low Vg and Vd values. This effect is observed with difficulty and is less pronounced than in n-channel MOSFETs.This publication has 18 references indexed in Scilit:
- Influence of substrate freeze-out on the characteristics of MOS transistors at very low temperaturesPublished by Elsevier ,2002
- Anomalous behaviour of n-channel MOS transistor characteristics in the temperature range 4.2–14 KSolid-State Electronics, 1989
- Model for hysteresis and kink behavior of MOS transistors operating at 4.2 KIEEE Transactions on Electron Devices, 1988
- Performance and hot-carrier effects of small CRYO-CMOS devicesIEEE Transactions on Electron Devices, 1987
- Operation of bulk CMOS devices at very low temperaturesIEEE Journal of Solid-State Circuits, 1986
- N-channel enhancement-mode MOSFET characteristics from 10 to 300 KIEEE Transactions on Electron Devices, 1981
- Simulation of impurity freezeout through numerical solution of Poisson's equation with application to MOS device behaviorIEEE Transactions on Electron Devices, 1980
- Very small MOSFET's for low-temperature operationIEEE Transactions on Electron Devices, 1977
- p-MOSFET parameters at cryogenic temperaturesIEEE Transactions on Electron Devices, 1976
- Semiconductor devices suitable for use in cryogenic environmentsCryogenics, 1974