Diffraction gratings of photosensitive ZrO_2 gel films fabricated with the two-ultraviolet-beam interference method
- 1 February 2000
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 39 (4) , 489-493
- https://doi.org/10.1364/ao.39.000489
Abstract
Photosensitive ZrO2 gel films were patterned with a two-beam interference method by use of a 325-nm-wavelength He–Cd laser for the first time to our knowledge. The ZrO2 gel films were prepared from Zr(O-n-C4H9)4 chemically modified with benzoylacetone. We fabricated uniform gratings with a 0.5-µm period on Si or SiO2 substrates by etching the gel films in ethyl alcohol after UV irradiation. A maximum diffraction efficiency of 28% was attained with the grating fabricated on Si substrate under a Littrow mounting condition by use of a 633-nm-wavelength He–Ne laser. Blazed gratings could also be fabricated.Keywords
This publication has 15 references indexed in Scilit:
- Direct printing of gratings on sol-gel layersOptical Engineering, 1998
- Fabrication and Characterization of Diffraction Gratings Using Photosensitive Al2O3 Gel FilmsJapanese Journal of Applied Physics, 1998
- Ultraviolet light imprinted sol-gel silica glass waveguide devices on siliconOptics Communications, 1996
- Fine-Patterning of ZrO2 Thin Films by the Photolysis of Chemically Modified Gel FilmsJapanese Journal of Applied Physics, 1994
- Photowritten gratings in ion-exchanged glass waveguidesOptics Letters, 1993
- Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase maskApplied Physics Letters, 1993
- Inhibited Spontaneous Emission in Solid-State Physics and ElectronicsPhysical Review Letters, 1987
- Embossing technique for fabricating surface relief gratings on hard oxide waveguidesApplied Optics, 1986
- Diffraction characteristics of photoresist surface-relief gratingsApplied Optics, 1984