Microhardness of non-stoichiometric TiCx, plates prepared by chemical vapour deposition
- 1 October 1990
- journal article
- Published by Elsevier in Journal of the Less Common Metals
- Vol. 163 (2) , 339-346
- https://doi.org/10.1016/0022-5088(90)90600-o
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Preparation of titanium carbide plates by chemical vapour depositionJournal of Materials Science, 1990
- TiC and TiN coatings formed on Si3N4TiC composite ceramics by chemical vapour depositionThin Solid Films, 1988
- Properties and structure of carbon excess TixC1−x deposited onto molybdenum by magnetron sputteringThin Solid Films, 1983
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structureThin Solid Films, 1983
- Effects of the experimental parameters on the preferred orientation of chemically vapor deposited TiC on cemented carbidesJournal of Vacuum Science and Technology, 1982
- The micro-Vickers hardness of TiC single crystals up to 1500° CJournal of Materials Science, 1977
- Activated Reactive Evaporation Process for High Rate Deposition of CompoundsJournal of Vacuum Science and Technology, 1972
- Hardness anisotropy, deformation mechanisms and brittle-to-ductile transition in carbideJournal of Materials Science, 1971
- Chemical vapor deposition in the titanium-carbon systemJournal of the Less Common Metals, 1971
- Étude des bandes de precipitation dans le carbure de titane sous stoechiométriqueJournal of the Less Common Metals, 1970