Prediction of fabrication distortions in step and flash imprint lithography templates
- 1 November 2002
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 20 (6) , 2891-2895
- https://doi.org/10.1116/1.1521743
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- High-resolution templates for step and flash imprint lithographyPublished by SPIE-Intl Soc Optical Eng ,2002
- Step and flash imprint lithography: Defect analysisJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2001
- Dynamic corrections in MEBES 4500Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994