X-ray measurement of elastic strain and annealing in semiconductors
- 1 February 1970
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 13 (2) , 105-112
- https://doi.org/10.1016/0038-1101(70)90040-7
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Versatile Double Crystal X-Ray GoniometerReview of Scientific Instruments, 1968
- Third-Order Elastic Moduli of Gallium ArsenideJournal of Applied Physics, 1967
- X-ray measurement of elastic strain and lattice constant of diffused siliconSolid-State Electronics, 1967