The nature of residual gases during the deposition of resistive thin films
- 1 September 1968
- Vol. 18 (9) , 517-518
- https://doi.org/10.1016/0042-207x(68)90847-6
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- The nature of residual gases during the evaporation of silicon oxideVacuum, 1967
- Evaporated cermet resistorsThin Solid Films, 1967