Processing of titanium films on silicon using a Q-switched ruby laser
- 1 November 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 144 (2) , 289-296
- https://doi.org/10.1016/0040-6090(86)90421-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Titanium and nickel silicide formation after Q-switched laser and multiscanning electron beam irradiationJournal of Applied Physics, 1982
- Resistivities of Thin Film Transition Metal SilicidesJournal of the Electrochemical Society, 1982
- Ion-beam mixing of metal-semiconductor eutectic systemsNuclear Instruments and Methods, 1981
- Dynamics of laser-induced formation of palladium silicideApplied Physics Letters, 1979
- Optical Properties and Oxidation of Evaporated Titanium Films*Journal of the Optical Society of America, 1957