Determination of the Critical Dose for Different Mass Ions Implanted into Silicon
- 1 January 1973
- book chapter
- Published by Springer Nature
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Energy deposition and penetration depth of heavy ions in the electronic stopping regionRadiation Effects, 1971
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- POST ANNEALING CONDUCTANCE BEHAVIOR OF IMPLANTED LAYERS IN SILICONApplied Physics Letters, 1969
- ON THE NUMBER OF ATOMS DISPLACED BY IMPLANTED IONS OR ENERGETIC RECOIL ATOMSApplied Physics Letters, 1969