REMOVAL OF PARTICULATE CONTAMINANTS USING ULTRASONICS AND MEGASONICS: A REVIEW

Abstract
Sonic cleaning is a commonly used technique for removal of particles from surfaces. The theory of particle removal using ultrasound is reviewed. Effects of cavitation and acoustic streaming are discussed. Experimental results using ultrasonics and megasonics (ultrasonic cleaning near 1 MHz) from the literature are reviewed. Emphasis is placed on removal of fine particles from silicon surfaces for semiconductor manufacturing applications.

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