Ion beam bombardment effects during films deposition
- 1 January 1988
- Vol. 38 (2) , 73-81
- https://doi.org/10.1016/0042-207x(88)90600-8
Abstract
No abstract availableThis publication has 43 references indexed in Scilit:
- Summary Abstract: Monte Carlo calculation for ion-assisted thin film depositionJournal of Vacuum Science & Technology A, 1986
- Summary Abstract: Reduction of optical scatter in coated metal surfacesJournal of Vacuum Science & Technology A, 1986
- Summary Abstract: Neutral ion beam deposition of high reflectance coatings for use in ring laser gyroscopesJournal of Vacuum Science & Technology A, 1986
- Internal stress in ion beam sputtered molybdenum filmsJournal of Vacuum Science & Technology A, 1986
- Summary Abstract: Characterization of ion beam deposited diamondlike carbon coating on semiconductorsJournal of Vacuum Science & Technology A, 1985
- The influence of discharge current on the intrinsic stress in Mo films deposited using cylindrical and planar magnetron sputtering sourcesJournal of Vacuum Science & Technology A, 1985
- Summary Abstract: Cluster formation and the percolation threshold in thin Au filmsJournal of Vacuum Science & Technology A, 1983
- Modification of niobium film stress by low-energy ion bombardment during depositionJournal of Vacuum Science and Technology, 1982
- Abstract: Ion beam deposition of thin films of ferroelectric lead zirconate titanate (PZT)Journal of Vacuum Science and Technology, 1979
- Structure and Electrical Properties of Sputtered Films of Hafnium and Hafnium CompoundsJournal of Applied Physics, 1970