Transient response of highly doped thin channel GaN metal–semiconductor and metal-oxide–semiconductor field effect transistors
- 31 May 2002
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 46 (5) , 711-714
- https://doi.org/10.1016/s0038-1101(01)00302-1
Abstract
No abstract availableKeywords
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