Deposition of high quality SiO2 layers from TEOS by excimer laser
- 1 January 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 36 (1-4) , 141-149
- https://doi.org/10.1016/0169-4332(89)90907-0
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- A Theoretical Study of the Low‐Temperature Chemical Vapor Deposition of SiO2 FilmsJournal of the Electrochemical Society, 1983
- The Deposition of Silicon Dioxide Films at Reduced PressureJournal of the Electrochemical Society, 1979
- Modeling of low-pressure deposition of SiO2by decomposition of TEOSIEEE Transactions on Electron Devices, 1979
- On the Mechanism of the Deposition of Silica by Pyrolytic Decomposition of SilanesJournal of the Electrochemical Society, 1965