Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography
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- 22 July 2005
- journal article
- Published by IOP Publishing in Nanotechnology
- Vol. 16 (9) , 1874-1877
- https://doi.org/10.1088/0957-4484/16/9/076
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Optical wire-grid polarizers at oblique angles of incidenceJournal of Applied Physics, 2003
- Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2001
- Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithographyApplied Physics Letters, 2000
- Large-area achromatic interferometric lithography for 100 nm period gratings and gridsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Imprint of sub-25 nm vias and trenches in polymersApplied Physics Letters, 1995