Spectroscopic investigation of the discharge for PA-CVD of TiN
- 1 March 1993
- journal article
- research article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 13 (1) , 93-101
- https://doi.org/10.1007/bf01447172
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Spectroscopic investigation of N2H2ArTiCl4-assisted chemical vapour deposition discharge for plasma of TiNMaterials Science and Engineering: A, 1991
- How TiN coatings improve the performance of high speed steel cutting toolsSurface and Coatings Technology, 1990
- Plasma chemical vapor deposition of TiNPlasma Chemistry and Plasma Processing, 1984
- The Identification of Molecular SpectraPublished by Springer Nature ,1976
- Tables of Spectral Lines of Neutral and Ionized AtomsPublished by Springer Nature ,1968