Spectroscopic investigation of N2H2ArTiCl4-assisted chemical vapour deposition discharge for plasma of TiN
- 1 July 1991
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 139, 37-40
- https://doi.org/10.1016/0921-5093(91)90592-b
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- How TiN coatings improve the performance of high speed steel cutting toolsSurface and Coatings Technology, 1990
- Excited atomic and molecular states in reactive plasmas used for titanium nitride deposition on steel surfacesJournal of Physics D: Applied Physics, 1985
- Analysis of a reactive sputter ion plating discharge for TiN deposition using optical emission spectroscopyThin Solid Films, 1985