Analysis of a reactive sputter ion plating discharge for TiN deposition using optical emission spectroscopy
- 1 February 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 124 (1) , 67-73
- https://doi.org/10.1016/0040-6090(85)90030-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Emission spectroscopy study of N2-H2glow discharge for metal surface nitridingJournal of Physics D: Applied Physics, 1984
- The activated reactive evaporation process: Developments and applicationsThin Solid Films, 1981
- La microanalyse de l'azote par l'observation directe de réactions nucléaires applicationsRevue de Physique Appliquée, 1969