Excited atomic and molecular states in reactive plasmas used for titanium nitride deposition on steel surfaces
- 14 August 1985
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 18 (8) , 1701-1708
- https://doi.org/10.1088/0022-3727/18/8/032
Abstract
Excited atomic and molecular states of Ar, N2 and H2 have been detected in plasmas pulverising Ti for TiN deposition on steel substrates. Emission spectroscopy has been used to measure relative densities of species between the emitter and the substrate. Such variations can be correlated to the coating composition which continuously varies from Ti2N close to the Ti emitter farther away.Keywords
This publication has 2 references indexed in Scilit:
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- La microanalyse de l'azote par l'observation directe de réactions nucléaires applicationsRevue de Physique Appliquée, 1969