Xenon excited state density measurements in electron beam pumped XeCl laser mixtures
- 14 December 1987
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 51 (24) , 1986-1988
- https://doi.org/10.1063/1.98319
Abstract
Time‐dependent density measurements of the lowest xenon excited states (5p56s) in electron beam (e‐beam) pumped XeCl laser mixtures (nonlasing) are performed using pulsed hook interferometry. The e‐beam pulse length is ≊0.45 μs (full width at half‐maximum) with an average excitation rate of ≊250 kW/cm3. Density differences (ΔN*) of transitions at 823.2 nm (6s[3/2]02 –6p[3/2]2), 828.0 nm (6s[3/2]01 –6p[1/2]0), and 840.9 nm (6s[3/2]02 –6p[3/2]1) are obtained for various HCl and Xe concentrations. For a 98.3% Ne/1.5% Xe/0.16% HCl mixture at 3000 Torr, ΔN* (823.2 nm) and ΔN*(828.0 nm) are relatively constant at ≊3×1014 and ≊1.7×1014 cm−3, respectively. At lower initial HCl concentrations, the ΔN*(823.2 nm) density starts out similar to the 0.16% HCl case, but tends to increase dramatically during the e‐beam pulse. For a 0.04% HCl mixture, a ΔN*(840.9 nm) density of ≊4.5×1015 cm−3 is measured at the end of the e‐beam pulse. Preliminary comparisons of the data with a computer model show good agreement for HCl concentrations ≥0.16%, but disagreements at leaner concentrations.Keywords
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