Ion energy analysis for sputtering-type electron-cyclotron-resonance microwave plasma
- 15 November 1988
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 64 (10) , 5179-5182
- https://doi.org/10.1063/1.342534
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Magnetic field gradient effects on ion energy for electron cyclotron resonance microwave plasma streamJournal of Vacuum Science & Technology A, 1988
- Low-energy ion extraction with small dispersion from an electron cyclotron resonance microwave plasma streamApplied Physics Letters, 1987
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- Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance PlasmaJapanese Journal of Applied Physics, 1983
- Microwave Plasma EtchingJapanese Journal of Applied Physics, 1977
- Surface investigation of solids by the statical method of secondary ion mass spectroscopy (SIMS)Surface Science, 1973