The influence of surface topography and angle of adatom incidence on growth structure in sputtered chromium
- 15 October 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 63 (1) , 121-129
- https://doi.org/10.1016/0040-6090(79)90112-3
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Physical vapor deposition of chromium and ironJournal of Vacuum Science and Technology, 1978
- Columnar microstructure in vapor-deposited thin filmsThin Solid Films, 1977
- Deposition rate and substrate temperature effects on the structure and properties of bulk-sputtered OFHC Cu and Cu–O.15 ZrJournal of Vacuum Science and Technology, 1975
- Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatingsJournal of Vacuum Science and Technology, 1975
- Structure/property relationships in evaporated thick films and bulk coatingsJournal of Vacuum Science and Technology, 1974
- Some effects of structure and composition on the properties of electron beam vapor deposited coatings for gas turbine superalloysJournal of Vacuum Science and Technology, 1974
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974
- Effects of deposition temperature and substrate bias on orientation and hardness of thick sputter deposited beryllium foilsJournal of the Less Common Metals, 1973
- Influence of condensation temperature on microstructure and tensile properties of titanium sheet produced by high-rate physical vapor deposition processMetallurgical Transactions, 1973
- Effect of substrate bias and deposition temperature on the properties of thick sputtered chromium depositsJournal of Applied Physics, 1972