Simulation of the Lithographic Properties of Ion-Beam Resists
- 1 January 1983
- book chapter
- Published by Springer Nature
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- A Monte Carlo computer program for the transport of energetic ions in amorphous targetsNuclear Instruments and Methods, 1980
- Ion-beam lithography for IC fabrication with submicrometer featuresJournal of Vacuum Science and Technology, 1979
- Physikalische Chemie der HochpolymerenPublished by Springer Nature ,1974
- Velocity of dissolution of polystyreneJournal of Polymer Science, 1957