Thickness dependent glass transition temperature of PECVD low-k dielectric thin films: effect of deposition methods
- 31 March 2002
- journal article
- Published by Elsevier in Microelectronics Journal
- Vol. 33 (3) , 221-227
- https://doi.org/10.1016/s0026-2692(01)00147-1
Abstract
No abstract availableKeywords
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