Ruthenium Oxide Nanotube Arrays Fabricated by Atomic Layer Deposition Using a Carbon Nanotube Template

Abstract
A chemical vapor deposition‐related method (atomic layer deposition) is reported to have been successfully used to fabricate an inorganic nanotube array at low temperatures (below 400 °C) for the first time. The Figure shows a scanning electron microscopy image of a ruthenium oxide nanotube array on top of an anodic aluminum oxide (AAO) matrix on a silicon wafer after removal of the carbon nanotube template.