Negative Resists Using Acid-Catalyzed Dehydration of Phenylcarbinols: Correlation between Chemical Structure and Resist Sensitivity
- 1 January 1996
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 8 (10) , 2433-2438
- https://doi.org/10.1021/cm960133c
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Negative-tone deep-ultraviolet resists containing benzylic crosslinkers: Experimental and simulation studies of the crosslinking processJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Mechanism of the Acid-Catalyzed Crosslinking of Poly(4-hydroxystyrene) by Polyfunctional Benzylic Alcohols: A Model StudyMacromolecules, 1994
- Photocrosslinking of Poly(4-hydroxystyrene) via Electrophilic Aromatic Substitution: Use of Polyfunctional Benzylic Alcohols in the Design of Chemically Amplified Resist Materials with Tunable SensitivitiesMacromolecules, 1994
- Novel chemically amplified dry-developing imaging materials for high resolution microlithography.Journal of Photopolymer Science and Technology, 1992
- Insolubilization mechanism of a chemical amplification negative-resist system utilizing an acid-catalyzed silanol condensation reactionChemistry of Materials, 1991
- Design of polymeric imaging materials based on electrophilic aromatic substitution: model studiesMacromolecules, 1991
- A new preparation of triarylsulfonium and -selenonium salts via the copper(II)-catalyzed arylation of sulfides and selenides with diaryliodonium saltsThe Journal of Organic Chemistry, 1978