Multiply Charged Ions by Constant Voltage Arc Ion Plating and Its Applications
- 1 March 1997
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 36 (3R)
- https://doi.org/10.1143/jjap.36.1245
Abstract
Applications of multiply charged ions are few. In the reactions between multiply charged ions and gases, different thin films are expected to be obtained. Among various methods to make thin films, arc ion plating is suitable for investigating the effect of ions because of its high ionization rate. For arc discharge, an ordinary constant voltage power source cannot be used, so a constant current power source is used. In order to control the discharge voltage, the author has devised a pulse power source, where the peak voltage of this pulse power source is controlled. By employing this new power source, TiN films of good quality are produced and are successfully applied to cutting tools.Keywords
This publication has 3 references indexed in Scilit:
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- On the properties of TiN films prepared by vacuum arc deposition process.SHINKU, 1987
- Erosion and ionization in the cathode spot regions of vacuum arcsJournal of Applied Physics, 1973