The inclusion of secondary electrons and Bremsstrahlung X-rays in an electron beam resist model
- 31 July 2002
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 61-62, 343-349
- https://doi.org/10.1016/s0167-9317(02)00531-2
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Three-dimensional electron-beam lithography simulationPublished by SPIE-Intl Soc Optical Eng ,1997
- Characterization and modeling of a positive-acting chemically amplified resistPublished by SPIE-Intl Soc Optical Eng ,1995
- Monte Carlo Methods and Microlithography Simulation for Electron and X-Ray BeamsPublished by Elsevier ,1987