Vapor development of poly(olefin sulfone) resists
- 1 July 1974
- journal article
- Published by Wiley in Polymer Engineering & Science
- Vol. 14 (7) , 525-528
- https://doi.org/10.1002/pen.760140712
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Radiation degradation of poly(2‐methylpentene‐1 sulfone)Journal of Polymer Science: Polymer Chemistry Edition, 1974
- Electron irradiation of poly(olefin sulfones). Application to electron beam resistsJournal of Applied Polymer Science, 1973
- Fundamental aspects of electron beam lithography. I. Depth-dose response of polymeric electron beam resistsJournal of Applied Physics, 1973
- A Simple Flying Spot Scanner Design for Electron LithographyReview of Scientific Instruments, 1973
- A New Family of Positive Electron Beam Resists—Poly(Olefin Sulfones)Journal of the Electrochemical Society, 1973