Optical properties at the metal-insulator transition in thermochromic VO2−xFx thin films
- 15 September 1988
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 64 (6) , 3327-3329
- https://doi.org/10.1063/1.341514
Abstract
Thermochromic VO2−xFx thin films were prepared by reactive rf magnetron sputtering followed by annealing post‐treatment. Electrical and optical properties were measured as a function of temperature. The transmittance and reflectance were essentially wavelength independent at 65 °C, i.e., at the metal‐insulator transition.This publication has 14 references indexed in Scilit:
- Metallic oxidesPublished by Elsevier ,2003
- Optical cross-over analysis of granular gold films at percolationOptics Communications, 1988
- Thermochromic VO2 films for energy-efficient windowsSolar Energy Materials, 1987
- Infrared optical properties of silicon oxynitride films: Experimental data and theoretical interpretationJournal of Applied Physics, 1986
- Electrical conductivity of vanadium dioxide films in the vicinity of the metal‐semiconductor phase transitionPhysica Status Solidi (b), 1976
- Metal-insulator transition in vanadium dioxidePhysical Review B, 1975
- Propriétés magnétiques et electriques de l'oxyfluorure de formule VO2−xFxJournal of Solid State Chemistry, 1975
- Preparation and properties of the oxyfluoride systems V2O5−xFx and VO2−xFxJournal of Solid State Chemistry, 1971
- The hydrothermal synthesis of V2O4−xFx derivativesMaterials Research Bulletin, 1971
- Infrared Optical Properties of Vanadium Dioxide Above and Below the Transition TemperaturePhysical Review Letters, 1966