Optimization of a self-aligned titanium silicide process for submicron technology
- 1 January 1990
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Semiconductor Manufacturing
- Vol. 3 (4) , 168-175
- https://doi.org/10.1109/66.61965
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
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