248 nm Lithography for 180 nm contact holes
- 1 June 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 53 (1-4) , 113-117
- https://doi.org/10.1016/s0167-9317(00)00276-8
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- 0.3 μm contact layer: process characterisationMicroelectronic Engineering, 1999