A strain monitor for ion implantation
- 1 August 1981
- journal article
- Published by IOP Publishing in Journal of Physics E: Scientific Instruments
- Vol. 14 (8) , 930-932
- https://doi.org/10.1088/0022-3735/14/8/009
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Threshold for Radiation Effects in SilicaPhysical Review B, 1972
- Simultaneous Thin-Film Stress and Mass-Change Measurements Using Quartz ResonatorsJournal of Applied Physics, 1972
- SENSITIVE TECHNIQUE FOR STUDYING ION-IMPLANTATION DAMAGEApplied Physics Letters, 1971
- LATTICE EXPANSION AND STRAIN IN ION-BOMBARDED GaAs AND SIApplied Physics Letters, 1970
- Fast-Neutron-Induced Changes in Quartz and Vitreous SilicaPhysical Review B, 1958