Deep UV photochemistry and patterning of self-assembled monolayer films
- 1 April 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 210-211, 359-363
- https://doi.org/10.1016/0040-6090(92)90257-c
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Coplanar patterns of self-assembled monolayers for selective cell adhesion and outgrowthThin Solid Films, 1992
- Deep UV Photochemistry of Chemisorbed Monolayers: Patterned Coplanar Molecular AssembliesScience, 1991
- Wet chemical approaches to the characterization of organic surfaces: self-assembled monolayers, wetting, and the physical-organic chemistry of the solid-liquid interfaceLangmuir, 1990
- Present status and future prospects of Langmuir-Blodgett film researchThin Solid Films, 1989
- Controlled outgrowth of dissociated neurons on patterned substratesJournal of Neuroscience, 1988
- Molecular monolayers and films. A panel report for the Materials Sciences Division of the Department of EnergyLangmuir, 1987
- Lipid-based tubule microstructuresThin Solid Films, 1987
- Rapid writing of fine lines in Langmuir-Blodgett films using electron beamsThin Solid Films, 1983
- Polymerized monomolecular layers: A new class of ultrathin resins for microlithographyThin Solid Films, 1980