Morphology and properties of sputtered TiN layers as a function of substrate temperature and sputtering pressure
- 1 April 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 126 (3-4) , 265-273
- https://doi.org/10.1016/0040-6090(85)90320-7
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
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- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974