The microstructure of reactively sputtered Ti-N films
- 1 September 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 107 (2) , 149-157
- https://doi.org/10.1016/0040-6090(83)90017-2
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977
- Influence of Adsorbed Gas on Surface Diffusion and NucleationJournal of Applied Physics, 1966