Damage Produced in Ge at Room Temperature by Indentation
- 1 June 1966
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 37 (7) , 2521-2526
- https://doi.org/10.1063/1.1782078
Abstract
Damage produced at room temperature by a spherical indenter on etch‐polished Ge surfaces and the effect of subsequent annealing at 550°C was studied with an optical microscope using interference contrast techniques. No evidence for dislocation glide at room temperature was obtained. Dislocation generation and motion during subsequent anneals occurred only in association with microcracks, which were in all cases observable without etching. By using dislocation etch pit counts to infer glide step heights, it was estimated that steps of height less than 15 Å may be detected with interference contrast under favorable conditions. Polished TiO2 and MgO cleavage surfaces were also indented and examined. Clear evidence for dislocation generation and motion was obtained in both cases.This publication has 15 references indexed in Scilit:
- High-Stress Low-Temperature Dislocation Kinetics of GeJournal of Applied Physics, 1965
- Dislocation Mobility in GermaniumPhysical Review B, 1963
- Dislocation arrays produced in germanium by room-temperature deformationPhilosophical Magazine, 1963
- Dislocations in Rutile as Revealed by the Etch‐Pit TechniqueJournal of the American Ceramic Society, 1962
- An Electromechanical Effect in SemiconductorsJournal of Applied Physics, 1962
- Etch pits in germanium and their relation to hardnessSolid-State Electronics, 1961
- On a new mode of deformation in indium antimonidePhilosophical Magazine, 1959
- Effects of environment on the fracture behavior of germaniumActa Metallurgica, 1958
- Hardness of germanium-silicon alloys at room temperatureActa Metallurgica, 1955
- Plastic Deformation of Ceramic‐Oxide Single CrystalsJournal of the American Ceramic Society, 1954