Nanoscale patterning of self-assembled monolayers by e-beam lithography
- 30 September 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 57-58, 903-907
- https://doi.org/10.1016/s0167-9317(01)00454-3
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Generation of Surface Amino Groups on Aromatic Self-Assembled Monolayers by Low Energy Electron Beams—A First Step Towards Chemical LithographyAdvanced Materials, 2000
- Modification of alkanethiolate monolayers on Au-substrate by low energy electron irradiation: Alkyl chains and the S/Au interfacePhysical Chemistry Chemical Physics, 1999
- Bond-selective dissociation of alkanethiol based self-assembled monolayers adsorbed on gold substrates, using low-energy electron beamsThe Journal of Chemical Physics, 1998
- High-resolution silicon patterning with self-assembled monolayer resistsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Sub-10 nm lithography with self-assembled monolayersApplied Physics Letters, 1996
- Formation and Structure of Self-Assembled MonolayersChemical Reviews, 1996
- Electron-Beam-Induced Damage in Self-Assembled MonolayersThe Journal of Physical Chemistry, 1996
- Nanostructuring of alkanethiols with ultrasharp field emittersJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Electron beam lithography with monolayers of alkylthiols and alkylsiloxanesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Lithographic patterning of self-assembled filmsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993