Diffraction-limited soft-x-ray projection imaging using a laser plasma source
- 15 October 1991
- journal article
- Published by Optica Publishing Group in Optics Letters
- Vol. 16 (20) , 1557-1559
- https://doi.org/10.1364/ol.16.001557
Abstract
Projection imaging of 0.1-μm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist and reactive ion etching. Low-contrast modulation at 0.05-μm lines and spaces is observed in polymethylmethacrylate.Keywords
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