Ion-beam induced silver doping in the Ag2Se/GeSe2-resist system
- 16 March 1988
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 106 (1) , 57-65
- https://doi.org/10.1002/pssa.2211060108
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Silver diffusion in Ag2Se/GeSe2 inorganic resist systemJournal of Vacuum Science & Technology B, 1986
- An inorganic resist technology and its applications to LSI fabrication processesMicroelectronic Engineering, 1984
- Germanium selenide: A resist for low-energy ion beam lithographyJournal of Vacuum Science and Technology, 1981
- The chemical reactivity and lithographic sensitivity of obliquely deposited germanium selenide films used as low energy ion beam resistsJournal of Vacuum Science and Technology, 1981
- A Monte Carlo computer program for the transport of energetic ions in amorphous targetsNuclear Instruments and Methods, 1980