Wetting Behavior of Liquid on Geometrical Rough Surface Formed by Photolithography
- 1 September 1994
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 33 (9A) , L1283
- https://doi.org/10.1143/jjap.33.l1283
Abstract
The effect of roughness on the wettability is studied. The rough surface is constructed with photoresist micropatterns which are formed by photolithography. The aspect ratio is defined as the length ratio between the pattern space and its height. Contact angles of three kinds of liquids, pure water, diiodomethane and ethylene glycol, increase and saturate with the increase of the aspect ratio. The wetting behavior of pure water of which higher surface energy is extremely complex.Keywords
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