Local-field corrections to surface and interface core-level shifts in insulators

We present a model for the extra-atomic contributions to core-level shifts in insulating thin films on polarizable substrates. The final-state shift is calculated from the screening-dependent local fields at a photoemitting atom and shown to be comparable to the initial-state Madelung potential shift in polar crystals. For Xe(111) films, our model completely accounts for experimental results. For NaCl(100) and ${\mathrm{CaF}}_2$(111) surfaces, we present predictions of surface core-level shifts for simple bulk terminations. We discuss corrections which can be incorporated into our model.